Jensen Huang says China could develop advanced lithography systems by 2030
NVIDIA CEO Jensen Huang said at the All-In Summit that China could build its own advanced lithography systems by 2030. He also said that once the technology is mature, China has strong large-scale manufacturing capacity, making it only a matter of time before domestically made equipment enters local wafer fabs. His view was more optimistic than a recent estimate from Carl Zeiss SMT executive Frank Rohmund, who said China may still need about 15 years to develop a domestic EUV lithography machine. Zeiss is a core supplier of optical systems for ASML’s EUV tools. The distinction matters, though: the host’s question referred to “advanced lithography systems” and did not specifically limit the discussion to EUV, and Huang did not clarify that he was talking about EUV in his reply.



