NVIDIA CEO Jensen Huang said at the All-In Summit that China could build its own advanced lithography systems by 2030. He also said that once the technology is mature, China has strong large-scale manufacturing capacity, making it only a matter of time before domestically made equipment enters local wafer fabs. His view was more optimistic than a recent estimate from Carl Zeiss SMT executive Frank Rohmund, who said China may still need about 15 years to develop a domestic EUV lithography machine. Zeiss is a core supplier of optical systems for ASML’s EUV tools. The distinction matters, though: the host’s question referred to “advanced lithography systems” and did not specifically limit the discussion to EUV, and Huang did not clarify that he was talking about EUV in his reply.
Jensen Huang said at the All-In Summit that China could build its own advanced lithography systems by 2030.
He also said that once the technology is mature, China has strong mass-production capacity, and that it would only be a matter of time before domestically made equipment enters Chinese wafer fabs.
The comment was more optimistic than a recent view from Frank Rohmund, head of semiconductors at Zeiss. Rohmund said China may still need about 15 years to build a domestic EUV lithography machine. Zeiss is a core supplier of optical systems for ASML’s EUV systems.
One detail is important: the host asked about "advanced lithography systems" and did not specifically restrict the question to EUV. Huang also did not go on to say that he was specifically referring to EUV in his answer.
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