Samsung Electronics has outlined a new lithography roadmap that puts High-NA EUV at the center of its future 1nm manufacturing plans. Speaking at the 2026 NGL conference on Aug. 11, Samsung technical expert Park Chang-min said the company plans to bring a major lithography advance into its 1nm process, with mass production potentially starting as early as 2030. Samsung said it aims to deploy High-NA EUV in high-volume manufacturing at the 1nm node and is now focused on developing the technologies needed for commercialization. The company also described 1nm as its A10 process, noting that 「A」 stands for angstrom, where 1 angstrom equals 0.1nm. Under the roadmap, Samsung expects to begin using High-NA EUV in mass production around 2030. The company has already commercialized its 2nm process and plans to start mass production of its 1.4nm SF1.4 process in 2029. It is also preparing to begin mass production of SF1.4+, an enhanced version of its 1.4nm process, alongside its 1nm process in 2030.
Samsung Electronics has laid out a next-generation lithography roadmap that calls for High-NA EUV to be used in mass production at the 1nm node, according to remarks delivered by Samsung technical expert Park Chang-min at the 2026 NGL conference on Aug. 11.
Park said Samsung plans to introduce a major lithography innovation into its 1nm process, which could enter volume production as early as 2030. The company said it is now working on the technologies needed to commercialize High-NA EUV, a next-generation extreme ultraviolet lithography technology.
Samsung also said it is stepping up development of High-NA EUV as part of its broader process roadmap. The company is treating 1nm, or A10, as the target node for full deployment in manufacturing. In Samsung's terminology, the "A" refers to angstrom, with 1 angstrom equal to 0.1nm.
Based on the roadmap presented at the event, Samsung expects to start using High-NA EUV in mass production around 2030.
On process timing, Samsung said it has already commercialized its 2nm process and plans to begin mass production of its 1.4nm SF1.4 process in 2029. It is also preparing to start mass production of SF1.4+, described as an enhanced version of the 1.4nm process, along with its 1nm process in 2030.
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